Plasma‐Enhanced Atomic Layer Deposition of Al$_{2}$O$_{3}$ on Graphene Using Monolayer hBN as Interfacial Layer
Canto, Bárbara; Otto, Martin; Powell, Michael J.; Babenko, Vitaliy; O'Mahony, Aileen; Knoops, Harm C. M.; Sundaram, Ravi S.; Hofmann, Stephan; Lemme, Max C.; Neumaier, Daniel (Corresponding author)
Weinheim : Wiley (2021)
Journal Article
In: Advanced materials technologies
Volume: 6
Issue: 11
Page(s)/Article-Nr.: 2100489
Institutions
- MICA - Advanced Microelectronic Center Aachen [052600]
- Chair of Electronic Devices [618710]
Identifier
- DOI: 10.1002/admt.202100489
- DOI: 10.18154/RWTH-2021-07619
- RWTH PUBLICATIONS: RWTH-2021-07619