Plasma‐Enhanced Atomic Layer Deposition of Al$_{2}$O$_{3}$ on Graphene Using Monolayer hBN as Interfacial Layer

Canto, Bárbara; Otto, Martin; Powell, Michael J.; Babenko, Vitaliy; O'Mahony, Aileen; Knoops, Harm C. M.; Sundaram, Ravi S.; Hofmann, Stephan; Lemme, Max C.; Neumaier, Daniel (Corresponding author)

Weinheim : Wiley (2021)
Journal Article

In: Advanced materials technologies
Volume: 6
Issue: 11
Page(s)/Article-Nr.: 2100489


  • MICA - Advanced Microelectronic Center Aachen [052600]
  • Chair of Electronic Devices [618710]