Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications

Cegielski, P. J. (Corresponding author); Bolten, J.; Kim, J. W.; Schlachter, F.; Nowak, C.; Wahlbrink, T.; Giesecke, A. L.; Lemme, Max C.

S.l.] : Elsevier (2018)
Journal Article

In: Microelectronic engineering
Volume: 197
Page(s)/Article-Nr.: 83-86

Institutions

• Chair of Electronic Devices [618710]