Triple-gate metal-oxide-semiconductor field effect transistors fabricated with interference lithography

Lemme, Max C.; Moormann, C.; Lerch, H.; Möller, M.; Vratzov, B.; Kurz, Heinrich

Bristol : IOP Publishing Ltd. (2004)
Journal Article

In: Nanotechnology
Volume: 15
Issue: 4
Page(s)/Article-Nr.: S208-S210


  • Chair of Semiconductor Electronics and Institute of Semiconductor Electronics [616210]
  • Chair of Electronic Devices [618710]