Hot-phonon temperature and lifetime in biased boron-implanted SiO2/Si/SiO2 channels
Liberis, J.; Matulioniene, I.; Matulionis, A.; Lemme, Max C.; Kurz, Heinrich; Först, Michael
Bristol : IOP Publ. (2006)
Journal Article
In: Semiconductor science and technology
Volume: 21
Issue: 6
Page(s)/Article-Nr.: 803-807
Institutions
- Chair of Semiconductor Electronics and Institute of Semiconductor Electronics [616210]
- Chair of Electronic Devices [618710]
Identifier
- DOI: 10.1088/0268-1242/21/6/017
- RWTH PUBLICATIONS: RWTH-CONV-032672