Large scale ultraviolet-based nanoimprint lithography
Vratzov, B.; Fuchs, A.; Lemme, Max C.; Henschel, W.; Kurz, Heinrich
New York, NY : American Institute of Physics (2003)
Journal Article
In: Journal of vacuum science & technology : JVST / B
Volume: 21
Issue: 6
Page(s)/Article-Nr.: 2760-2764
Institutions
- Chair of Semiconductor Electronics and Institute of Semiconductor Electronics [616210]
- Chair of Electronic Devices [618710]
Identifier
- DOI: 10.1116/1.1627816
- RWTH PUBLICATIONS: RWTH-CONV-032649